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Plasma Characterization of Pulsed-Laser Ablation Process Used for Fullerene-like CNx Thin Film Deposition
Plasma Characterization Pulsed-Laser Ablation Process Fullerene-like CNx Thin Film Deposition
2010/10/27
Plasma Characterization of Pulsed-Laser Ablation Process Used for Fullerene-like CNx Thin Film Deposition.