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The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary t...
SPIE appoints Chris Mack editor of 'Journal of Micro/Nanolithography, MEMS, and MOEMS'
SPIE Micro/Nanolithography MEMS MOEMS
2011/4/22
SPIE has announced the appointment of renowned lithography expert Chris A. Mack, adjunct faculty member at the University of Texas at Austin, as editor of the Journal of Micro/Nanolithography, MEMS, a...
Symbiotic Optimization of the Nanolithography and RF-Plasma Etching for Fabricating High-Quality Light-Sensitive Superconductors on the 50 nm Scale
Symbiotic Optimization Nanolithography High-Quality Light-Sensitive Superconductors
2010/11/24
We present results of a fabrication-process development for the lithographic pattern transfer into the nm100sub range by combining electron-beam lithography and reactive dry etching to obtain ...