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ZnO films were grown on c-Al2O3 substrates by metal-organic chemical vapor deposition (MOCVD). Thermal annealing was performed at 700℃ in growth conditions and in oxygen atmosphere for 30minutes. Th...
In this report, we have overcome the drawback of surface roughness of metamorphic buffer layer by LP-MOCVD technique and have grown InP metamorphic buffer layers with various thickness on misoriented ...
CdTe epitaxial layers are grown successfully on a (100)-GaAs substrate by metalorganic chemical vapor deposition (MOCVD) using dimethylcadrnium (DMCd) and diethyltelluride (DETe) as alkyl sources. The...
LiNbO3 is used as a single crystalline substrate material for the manufacturing of surface acoustic wave devices as frequency selective components. On the polished substrate wafer, Al with a film thic...
Superconducting thick films of the Y-Ba-Cu-O system prepared by screen-printing and sintering on different substrates were investigated to study the effect of the substrate material on the superconduc...
The temperature characteristics of RuO2-based thick film resistors on various substratcs having different thermal expansion coefficient have been investigated.It became clear that, if the thermal expa...
The effect of extended thermal cycling on the reliability of joints between ceramic leadless chip carriers and various printed circuit board type substrates is examined. Test results indicate success ...
The preparation of steel substrates coated with intermediate ground and final ceramic coatings is described. The basic material for the preparation of both coatings is the same kind of special glass. ...
In a previous paper, we showed, with a microwave quality factor (Q) measurement, that in the X band and with alumina substrates, thick film losses are not worse than thin film losses when the inks are...
The arc plasma spraying process was applied to obtain ceramic coatings on stainless steel substrates. The outer coatings were formed from pure alumina or alumina + 2 wt. % titania mixture. The nichrom...

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